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DAC
2000
ACM
16 years 2 days ago
Model-based dummy feature placement for oxide chemical-mechanical polishing manufacturability
—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
Ruiqi Tian, D. F. Wong, Robert Boone
DOLAP
1999
ACM
16 years 21 hour ago
Updating OLAP Dimensions
OLAP systems support data analysis through a multidimensional data model, according to which data facts are viewed as points in a space of application-related dimensions", or...
Carlos A. Hurtado, Alberto O. Mendelzon, Alejandro...
ICDCS
1999
IEEE
16 years 7 hour ago
Proxy Cache Coherency and Replacement - Towards a More Complete Picture
This work studies the interaction of Web proxy cache coherency and replacement policies using trace-driven simulations. We specifically examine the relative importance of each typ...
Balachander Krishnamurthy, Craig E. Wills
CAISE
1999
Springer
15 years 12 months ago
A Practical Approach to Access Heterogeneous and Distributed Databases
A common problem within most large corporations nowadays is the diversity of database systems that are employed by their many departments in the development of a product. Usually, ...
Fernando de Ferreira Rezende, Ulrich Hermsen, Geor...
CIA
1999
Springer
15 years 12 months ago
A Similarity Evaluation Technique for Cooperative Problem Solving with a Group of Agents
Abstract. Evaluations of distances or similarity measurements are very important in cooperative problem solving with multiple agents. Distance between problems is used by agents to...
Seppo Puuronen, Vagan Y. Terziyan