Automatic pattern search in event traces is a powerful method to identify performance problems in parallel applications. We demonstrate that knowledge about the virtual topology, ...
Nikhil Bhatia, Fengguang Song, Felix Wolf, Jack Do...
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
In this paper the effectiveness of a corrective learning algorithm MIL (Mirror Image Learning) [1], [2] is comparatively studied with that of GLVQ (Generalized Learning Vector Qua...
In this paper we present a minimum sphere covering approach to pattern classification that seeks to construct a minimum number of spheres to represent the training data and formul...
We analyze the performance of simple algorithms for matching two planar point sets under rigid transformations so as to minimize the directed Hausdorff distance between the sets....