8808 search results - page 334 / 1762 » Process Change Patterns |
216
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ICML
1997
IEEE
16 years 8 months ago
1997
IEEE
Machine learning techniques are applicable to computer system optimization. We show that shared memory multiprocessors can successfully utilize machine learning algorithms for mem...
192
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KDD
2006
ACM
16 years 7 months ago
2006
ACM
In this work we focus on the problem of frequent itemset mining on large, out-of-core data sets. After presenting a characterization of existing out-of-core frequent itemset minin...
189
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ICCAD
2008
IEEE
16 years 4 months ago
2008
IEEE
— As Double Patterning Technology (DPT) becomes the only solution for 32-nm lithography process, we need to investigate how DPT affects the performance of a chip. In this paper, ...
204
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PDP
2010
IEEE
16 years 2 months ago
2010
IEEE
Abstract—The evolution towards cross-organizational collaboration and interaction patterns has led to the emergence of scalable, Web services-based composition infrastructures. T...
209
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ISPD
2010
ACM
16 years 2 months ago
2010
ACM
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...