8808 search results - page 467 / 1762 » Process Change Patterns |
191
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DAC
2000
ACM
15 years 12 months ago
2000
ACM
—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
208
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AC
1994
Springer
15 years 11 months ago
1994
Springer
In this paper we present a simulation package developed to evaluate and optimize both the channel propagation losses and the multipath dispersion of the indoor optical channel. Th...
172
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CIC
2004
15 years 9 months ago
2004
With a better understanding of how probe packets and cross-traffic packets interact with each other, more accurate measurement methods based on active probing can be developed. Sev...
190
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ICPR
2010
IEEE
15 years 5 months ago
2010
IEEE
Detecting abnormal behaviors in crowd scenes is quite important for public security and has been paid more and more attentions. Most previous methods use offline trained model to p...
212
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DPD
2010
15 years 5 months ago
2010
In distributed database systems, tables are frequently fragmented and replicated over a number of sites in order to reduce network communication costs. How to fragment, when to rep...