2169 search results - page 291 / 434 » Using Risk Analysis to Evaluate Design Alternatives |
203
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ICCAD
2009
IEEE
15 years 4 months ago
2009
IEEE
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
200
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CAV
2009
Springer
16 years 7 months ago
2009
Springer
Recent development on distributed systems has shown that a variety of fairness constraints (some of which are only recently defined) play vital roles in designing self-stabilizing ...
167
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OSS
2009
Springer
16 years 1 months ago
2009
Springer
The quantitative analysis of software projects can provide insights that let us better understand open source and other software development projects. An important variable used in...
208
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RTCSA
2006
IEEE
16 years 1 months ago
2006
IEEE
In this paper we analyze the traditional model of interrupt management and its inability to incorporate the reliability and temporal predictability demanded by real-time systems. ...
211
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ICDAR
2003
IEEE
16 years 8 days ago
2003
IEEE
In off-line handwriting recognition, classifiers based on hidden Markov models (HMMs) have become very popular. However, while there exist well-established training algorithms, s...